MOCVD for High-volume Manufacturing of MicroLEDs

MicroLED technology offers exciting and differentiated performance capabilities for advanced display applications as well as for the rapidly growing field of optical interconnects. Central to this technology is metalorganic chemical vapor deposition (MOCVD), the foundational epitaxial growth process creating the device structure and serving as the starting point of microLED manufacturing. Effective implementation of the MOCVD process at scale enables the commercial success of these applications.

This presentation will introduce the principles of MOCVD and examine its role in the production of microLED devices. Topics will include MOCVD reactor design, process control methodologies, epitaxial growth fundamentals, and the GaN- and GaAs-based material systems used for display and optical interconnect applications. The discussion will highlight the opportunities and challenges in scaling MOCVD technology to high-volume manufacturing.