Nano Imprinting Lithography From Single DIE to Wafer-Level HVM

Wafer-level nanoimprint lithography (NIL) is an increasingly important technology in the photonic industry, enabling precise replication of structures with complex geometries and sub-100nm resolution. NIL allows for the straightforward transfer of optical components with advanced patterning requirements to high volume manufacturing, with multiple structures replicated accurately over a large area in a single step. The fabrication of highly individual and high-performing optical structures relies on a combination of mastering techniques, replication equipment, and qualified imprint materials.
In this presentation, we will explore well-known lithography mastering techniques and recent advancements in 2-Photon-Polymerisation. We will discuss the path from prototyping using a single DIE master to achieving a fully populated wafer-level master. Additionally, we will address the factors necessary for achieving mature high-volume replication of optical structures using UV NIL, taking into consideration equipment requirements and material properties.