Gauthier Briere | ATLANT 3D: How do you deposit high-index titanium dioxide on delicate MEMS mirrors without risk of mechanical damage?
00:10:49 - 00:12:20
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How do you deposit high-index titanium dioxide on delicate MEMS mirrors without risk of mechanical damage?
Depositing optical coatings onto pre-fabricated, fragile structures like MEMS mirrors poses a severe engineering challenge. Conventional liftoff and wet etching techniques expose delicate micro-mirrors to aggressive chemicals and capillary forces that can cause device failure.
Using spatial atomic layer deposition, high-index titanium dioxide can be written selectively on active MEMS components while completely bypassing the red-zone exclusion areas. The proprietary software maps the precise coordinates of the nozzle path to match the existing device layout.
This localized process delivers highly conformal, optical-grade materials exactly where they are needed without requiring global masking. It represents a vital tool for adding functional optical layers to finished CMOS and micro-opto-electro-mechanical systems.
In this short video, you can learn:
* How to selectively deposit high-refractive-index materials on pre-patterned MEMS structures.
* The software-driven coordinate alignment method for maskless, localized direct-write ALD.
* How to avoid mechanical and chemical damage to delicate micro-mirrors during post-processing.
π **Clip Abstract** Gauthier details a real-world application of maskless spatial ALD, where titanium dioxide was selectively deposited onto sensitive MEMS structures. This direct-write technique completely bypasses risky lithography steps, protecting fragile micro-mirrors while maintaining high spatial precision.
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#SpatialAtomicLayerDeposition, #DirectWriteALD, #MEMSMirrors, #TitaniumDioxide, #MicroOptics, #ARDisplays
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00:03:58 - 00:05:01
Why is spatial Atomic Layer Deposition superior to temporal ALD for local patterning?
Why is spatial Atomic Layer Deposition superior to temporal ALD for local patterning?
Traditional atomic layer deposition relies on temporal cycling where precursor and co-reactant gases are sequentially introduced into a vacuum chamber. This process yields highly conformal films but is inherently slow and requires lithographic masking for spatial patterning.
By contrast, spatial atomic layer deposition utilizes a specialized micro-nozzle that delivers precursor and co-reactant gases simultaneously through distinct channels. This localized gas delivery allows the system to deposit precise monolayers directly onto specific areas of a substrate using high-resolution mechanical translation.
This direct-write capability drastically simplifies the fabrication workflow by eliminating the need for photoresist spin-coating, exposure, and etching. Developers can now run rapid prototyping cycles on selected regions of a wafer without altering the underlying active micro-components.
In this short video, you can learn:
* The operational differences between temporal and spatial atomic layer deposition (sALD).
* How a localized micro-nozzle delivers gas lines simultaneously for direct-write monolayer growth.
* The processing advantages of avoiding full-wafer deposition during early-stage prototyping.
π **Clip Abstract** Gauthier Briere explains the transition from traditional temporal atomic layer deposition to spatial ALD using a proprietary micro-nozzle. This allows the simultaneous delivery of precursor and co-reactant gases, achieving localized, maskless direct-write monolayer growth via mechanical translation.
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#SpatialALD, #DirectWrite, #MasklessPatterning, #MicroNozzle, #PrintedElectronics, #AdditiveElectronics
00:07:07 - 00:08:42
How can micro-nozzle spatial ALD print continuous thickness gradients on a single substrate?
How can micro-nozzle spatial ALD print continuous thickness gradients on a single substrate?
Creating thickness variations or 3D optical structures usually requires multi-step photolithography, gray-scale masking, or complex etching profiles. These conventional methods are time-consuming and often introduce surface roughness that degrades optical performance.
With spatial atomic layer deposition, thickness gradients can be printed dynamically by adjusting the scan speed or the number of translation passes over the substrate. This allows researchers to deposit complex geometrical profiles and variable-height structures in a single maskless processing step.
This technology is particularly powerful for rapid material screening and optical characterization. By printing a continuous gradient of film thickness on a single wafer, scientists can map index of refraction, absorption, and structural properties in a fraction of the time.
In this short video, you can learn:
* How to deposit geometric and thickness gradients using programmed micro-nozzle step increments.
* The benefits of maskless gradient printing for characterizing thin-film optical properties rapidly.
* How variable deposition parameters can be evaluated on a single substrate to optimize film quality.
π **Clip Abstract** This segment explores how spatial atomic layer deposition enables the fabrication of localized thickness and geometric gradients on a single substrate. By dynamically adjusting translation steps and precursor flows, researchers can rapidly map material properties and accelerate thin-film characterization.
Link in comments π
#SpatialALD, #MicroNozzlePrinting, #GradientThinFilms, #MasklessDeposition, #OpticalWaveguides, #PrintedElectronics