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Najeeb Khalid

Two Photon Research Inc.

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Najeeb Khalid | Two Photon Research Inc.: How can you grow red, green, and blue GaN emitters simultaneously in one process by just changing the diameter of a nanorod?

16:13 - 18:27

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How can you grow red, green, and blue GaN emitters simultaneously in one process by just changing the diameter of a nanorod?

Najeeb Khalid explains the physics behind growing multiple colors in a single Molecular Beam Epitaxy (MBE) process step, a core innovation that eliminates the need for separate RGB wafers. The mechanism relies on controlling the diffusion length of atoms impinging on the wafer surface. The key insight is that the travel distance for atoms from the base of the wafer to the quantum well at the top of a nano-emitter changes with the emitter's diameter.

The color is determined by the concentration of Indium in the Indium Gallium Nitride (InGaN) quantum well. The process leverages the differential diffusion of Indium atoms versus Gallium atoms on the surface. Because the travel path to the quantum well is longer on wider-diameter nano-emitters and shorter on narrower ones, the final concentration of Indium incorporated into the quantum well varies systematically with the emitter's geometry.

This relationship is predictable and controllable: smaller diameter emitters (e.g., 60-80 nm) incorporate more Indium, shifting the emission towards red, while larger diameter emitters (e.g., 400-500 nm) incorporate less Indium, resulting in blue emission. By pre-patterning a single mask with holes of varying diameters, one can precisely define the location of every red, green, and blue subpixel on the wafer. The entire color palette is thus encoded in the initial lithography pattern, with the subsequent MBE growth step executing this color plan simultaneously across the wafer.

In this short video, you can learn:
* The role of atomic diffusion length in determining InGaN composition.
* How nano-emitter diameter directly controls the incorporation of Indium to tune color.
* The method of using a single patterned mask to define a full-color display layout.
πŸ“‹ **Clip Abstract** The speaker reveals the core physics behind their single-step, multi-color growth process. He explains how varying the diameter of the nano-emitters alters the diffusion path for Indium atoms, thereby controlling the InGaN composition and emission wavelength without needing separate growth runs or masks for RGB.
πŸ”— Link in comments πŸ‘‡

#GaNNanorodRGB, #MBEGrowth, #IndiumDiffusionControl, #InGaNComposition, #MicroLEDDisplays, #ARDisplayTech

This is a highlight of the presentation:

Tpr Nano-emitters, end of mass transfer

MicroLEDs, AR/VR Displays, Micro-Optics 2025: Innovations, Start-Ups, Market Trends

Online | TechBlick platform

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MicroLED Connect

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00:00:37 - 00:02:44

Can going 1,000x smaller solve the existential efficiency droop of micro-LEDs?

Can going 1,000x smaller solve the existential efficiency droop of micro-LEDs?

Traditional micro-LED display technologies have hit a commercialization bottleneck, heavily constrained by sidewall defects and efficiency droop at smaller dimensions. By transitioning to sub-micron "nano-emitters" (nanocolumns) grown via Molecular Beam Epitaxy (MBE), semiconductor physics takes over from chemistry. This physical growth paradigm eliminates chemical precursor impurities and lattice dislocations.

Unlike conventional planar GaN films where shrinking dimensions degrades the External Quantum Efficiency (EQE), these nanocolumns show an inverse relationship: as the nanocolumn diameter decreases, the EQE actually increases. To maximize light extraction, specialized P-contacts are integrated, boosting the final optical output efficiency by an additional 15% through optimized interface processes.

By exploiting dislocation-free crystalline growth in an ultra-high vacuum environment, this structural transition allows for high-performance sub-micron optoelectronics. This represents a massive shift in how next-generation micro-displays, AR glasses, and high-density optoelectronic arrays can be manufactured.

In this short video, you can learn:
* Why transitioning from chemical MOCVD to physical MBE growth eliminates lattice dislocations.
* The anomalous scaling effect where EQE increases as the nanocolumn diameter decreases.
* How engineered P-contacts further enhance light extraction by up to 15%.

πŸ“‹ **Clip Abstract** Discover how transitioning from micro-LEDs to sub-micron nanocolumns grown via Molecular Beam Epitaxy bypasses traditional efficiency droop. Learn why physical epitaxy processes eliminate dislocations and allow quantum efficiency to increase at smaller scales.

#MolecularBeamEpitaxy, #GaNNanocolumns, #EfficiencyDroop, #SubMicronOptoelectronics, #MicroLEDDisplays, #ARDisplays

00:14:15 - 00:16:15

How can you grow a full-color RGB display on a single wafer in a single step?

How can you grow a full-color RGB display on a single wafer in a single step?

Monolithic integration of RGB micro-LEDs on a single wafer has long been a holy grail for display manufacturers. By utilizing GaN nanocolumns, the indium incorporation rate is dictated directly by the column diameter: smaller diameter columns naturally incorporate higher indium concentrations. This allows for multi-wavelength (RGB) emission across the full visible spectrum to be grown in a single, 1.5-hour MBE step.

Furthermore, this growth mechanism exhibits a self-filtering defect property. When grown on a low-cost, low-quality GaN template with high dislocation densities, all active dislocations completely filter out and disappear within the first 100 nanometers of nanocolumn growth. Beyond a height of 315 nanometers, the nanocolumn tops coalesce into a flat, defect-free surface.

This structural coalescence yields a continuous thin-film morphologic surface that behaves like a perfect single crystal without dislocations or impurities. The resulting planar-like active layer produces a 30% increase in External Quantum Efficiency compared to conventional planar growth, without requiring complex lithography.

In this short video, you can learn:
* How changing nanocolumn diameter controls localized indium incorporation for single-step RGB growth.
* The dislocation filtering mechanism that eliminates crystal defects within the first 100 nm of growth.
* How nanocolumn coalescence forms flat, defect-free surfaces with 30% higher quantum efficiency.

πŸ“‹ **Clip Abstract** Learn how changing the spatial diameter of GaN nanocolumns enables full-color RGB emission on a single wafer in one epitaxy step. Discover the structural self-filtering mechanism that completely eliminates dislocations to boost quantum efficiency by 30%.

#GaNNanocolumns, #MonolithicRGB, #DislocationFiltering, #EpitaxialCoalescence, #MicroLEDDisplays, #ARLightEngines

00:02:44 - 00:05:35

Why has the semiconductor industry avoided MBE for large-scale production?

Why has the semiconductor industry avoided MBE for large-scale production?

Molecular Beam Epitaxy (MBE) offers unparalleled crystal purity, yet it remains largely sidelined in commercial manufacturing due to severe calibration bottlenecks. Historically, calibrating an MBE tool can take up to four weeks because ultra-high vacuum environments prevent direct contact wafer temperature sensing. This limitation causes discrepancies of up to 250Β°C between the heater and the actual wafer.

To break this deadlock, a novel suite of tools was developed, including a non-contact temperature reader and a physics-based simulation framework. By utilizing a customized Monte Carlo algorithm to map atom-by-atom kinetics on a spatial grid, the computational overhead of simulation was slashed. Computation times dropped from six months down to just five days.

This allows researchers to accurately predict precise atomic fluxes (gallium, nitrogen, indium) and localized temperatures needed to achieve defect-free crystals. This predictive simulation bypasses weeks of empirical trial-and-error, paving the path for high-throughput, commercially viable MBE production.

In this short video, you can learn:
* The primary hardware and thermal calibration bottlenecks preventing commercial MBE adoption.
* How Monte Carlo algorithms reduce atomic-scale crystal growth simulation times from months to days.
* The role of non-contact temperature readers in controlling high-vacuum, high-temperature epitaxy.

πŸ“‹ **Clip Abstract** Explore the key reasons behind the commercial limitations of Molecular Beam Epitaxy, focusing on extreme thermal calibration hurdles. Learn how a Monte Carlo simulation tool slashes computational times to accelerate defect-free crystal growth prediction.

#MolecularBeamEpitaxy, #KineticMonteCarlo, #ThermalCalibration, #NonContactPyrometry, #SemiconductorManufacturing, #WideBandgapSemiconductors

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