Multifunctional metasurfaces for everyday printed electronic functional films

Meta Materials Inc. is developing discrete platform specific proprietary technologies for large-surface-area lithography, allowing the manufacture of nanostructures to be carried out in a cost-effective manner. Each platform employs a massively parallel patterning scheme, designed to be scalable to large areas of either rigid substrate materials and rolls of flexible films. In certain cases we use a phase-shift mask approach and in others, cast plasmonic printing – all allowing the creation of structures with feature sizes down to 50 nm.